High temperature chemical vapor deposition system of XX Research Institute in China

Time：2023-03-23 Click：0

Customer: High temperature chemical vapor deposition system of XX Research Institute in China

Application: This high-temperature CVD system is mainly used for the research on the chemical vapor deposition preparation process of TaC, HfC and other materials and their composite carbides and other ultra-high melting point coatings

Features:
1. Small footprint and powerful functions, integrating high-temperature reaction chamber, solid material vaporization chamber, precise mass flow meters for various gases, vacuum system, and cooling system
2. The whole set of equipment can work in a vacuum/atmosphere protection environment
3. The interface of the touch screen is friendly and practical, it can display and monitor the running status of the equipment, it can call, edit and store the sintering process, and it has the functions of dynamic display, historical data recording and exporting
4. Corrosion resistance of pipelines and related instruments
5. There is no condensation during the transportation of the vaporized gas, and the pipeline will not be blocked

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High temperature chemical vapor deposition system of XX Research Institute in China

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