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Diffusion Oxidation Furnace (Research Type)
  • Diffusion Oxidation Furnace (Research Type)
  • Diffusion Oxidation Furnace (Research Type)
  • Diffusion Oxidation Furnace (Research Type)
  • Diffusion Oxidation Furnace (Research Type)
  • Diffusion Oxidation Furnace (Research Type)

    Model:KJ-T1300D

    Description:

    This equipment is a scientific research diffusion oxidation furnace, which is suitable for research and teaching in enterprise R&D, universities and research institutes.

    Description:
        This equipment is a scientific research diffusion oxidation furnace, which is suitable for research and teaching in enterprise R&D, universities and research institutes. It can meet closed-tube dry oxygen oxidation, wet oxygen oxidation, hydrogen oxygen synthesis oxidation, diffusion, annealing at atmospheric pressure, annealing/propulsion, alloying and other processes.
     Diffusion Oxidation Furnace
    Main Features:
    ●It can meet closed-tube dry oxygen oxidation, wet oxygen oxidation, hydrogen oxygen synthesis oxidation, diffusion, annealing at atmospheric pressure, annealing/propulsion, alloying and other processes.
    ●Using high-reliability industrial control computer + PLC mode, automatic control the furnace temperature, advancing and retreating boat, gas flow and valves, realize the automation of all technological processes;
    ●With strong software functions, equipped with fault self-diagnosis software, which can greatly save maintenance time;
    ●With various of process pipelines, convenient for users to choose;
    ●It has powerful software functions and is equipped with fault self-diagnosis software, which can greatly save maintenance time;
    ●Automatic adjustment of the constant temperature zone, cascade control, can accurately control the actual process temperature of the reaction tube;
    ●With over temperature broken thermocouple, thermocouple short circuit, process gas flow deviation alarm and protection functions;
    ●Products can be customized according to user requirements.
     
    Technical Parameters:
    ●Applicable wafer size: 2~8 inch wafer
    ●Working temperature: 600℃~1300℃;
    ●The number of tubes that can be equipped: 1~2 tubes/ set
    ●Length and accuracy of constant temperature zone: ≤±0.5℃/300~600mm (800℃~1300℃),
    ● Single-point temperature stability: ≤±0.5℃℃ /24h (1100℃);
    ●Temperature ramp capability: the maximum heating rate is 20℃/min, the maximum cooling rate is 5℃/min;

    Diffusion Oxidation Furnace

    Diffusion Oxidation Furnace

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    180-3717-8440

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