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Whatapp:
Address:Room 1505, Building 9, No. 26 Dongqing Street, Zhengzhou High-tech Industrial Development Zone
Tel Number
180-3717-8440
1. System function and composition
The system is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, rotating substrate table, heating system, DC power supply, RF power supply, working gas path, film thickness meter, vacuum acquisition system, installation machine, vacuum measurement, water cooling and alarm system and control system, etc. It can be used for the preparation of metal thin film, dielectric film, etc.
2. Main components and technical indicators of the system
Sputtering chamber ultimate vacuum degree: ≤6.6x10-5Pa (after baking and degassing);
System vacuum leak detection rate: ≤5.0x10-7Pa.l/S;
The system starts to evacuate from the atmosphere: the sputtering chamber can reach 6.6x10-4 Pa in 35 minutes;
The vacuum degree after the system stops pumping and shuts down for 12 hours: ≤5Pa;
1. Sputtering vacuum chamber------------- 1 set
The vacuum chamber is a square box-shaped front-opening structure with a size of 400mmx400mmx400mm and a full stainless steel structure. It can be baked to 100-150℃, made of stainless steel, argon arc welding, electrochemical polishing and passivation treatment on the surface, and the interface is sealed with a metal gasket or a fluororubber ring; manual front-opening structure; the target is installed on the lower cover, and the substrate turntable is on the upper flange.
2. 3 sets of magnetron sputtering targets
2.1. Target size: Ф50mm;
2.2. Target materials provided: 3 test targets (Ti, stainless steel)
2.3. Permanent magnet targets (one of which can sputter magnetic materials), RF sputtering and DC sputtering are compatible, and the target is water-cooled;
2.4. Imported SMC rotary pneumatic control baffle assembly: 3 sets;
2.5. Target is on top, sputtering downward, confocal magnetron sputtering target (sputtering target angle is adjustable), distributed on a circle, each target can work independently/sequentially/together;
2.6. 1 set of 500 DC power supply
2.7. 2 sets of 500w fully automatic tuning RF power supply
2.8. The distance between the magnetron target and the substrate is adjustable, and the adjustment distance is: 90~130mm
3. Rotating substrate table--------------- 1 set
3.1 Substrate size and quantity: 1 sample with a maximum diameter of 100
3.2. The substrate is heated by imported heating wire, the heating temperature is: room temperature-600°C, controlled by thermocouple closed-loop feedback, controllable and adjustable; it can be insulated and sealed to withstand -1000V high voltage.
3.3. The substrate revolution is driven by a speed regulating motor, 0-30 rpm continuously adjustable, the rotation speed
3.4. Imported SMC corner cylinder sample baffle assembly 1 set
4. Window and flange interface components----------------- 1 set
4.1. CF100 glass window: 1 piece of UV-proof glass can be added; CF63 glass window: 1 piece;
4.2. CF35 ceramic sealing lead flange: 2 pieces (lighting and internal baking lead);
4.3. Blind flange: CF16: 1 piece; CF35: 2 pieces.
4.4, CF40: 2, KF25: 1, 2*1” additional inlet: 1
5, Heating device------------- 1 set
The heating device is on the upper flange of the vacuum chamber to heat the substrate support plate, and the closed-loop control is achieved by controlling the temperature control power supply through a thermocouple. The system consists of a heater and a heating temperature control power supply. The heating power supply is equipped with a temperature control meter imported from Japan, and the temperature control method is PID automatic temperature control and digital display; Sample heating temperature: room temperature ~ 800°C, continuously adjustable;
6, Working gas circuit----------------- 1 set
6.1, 100SCCM argon, 20SCCM oxygen, 50SCCM nitrogen, 50SCCM methane, high-quality flow controller, CF16 electric stop valve, pipeline, connector, etc.: a total of 4 circuits.
6.2 DN16 pneumatic inflation valve, DN16 pneumatic deflation valve, pipeline, connector, etc.: 4 circuits;
7, Vacuum unit and valves, pipelines---------------- 1 set
7.1. Compound molecular pump and variable frequency control power supply: 1 set
7.2. Mechanical pump: RVP-14, 14L/S 1 set;
7.3. DN40 electric stop valve: 1 set;
7.4. Side extraction pipeline between mechanical pump and vacuum chamber: 1 set;
7.5. CC200 electric gate valve: 1 set;
7.6. DN40 side extraction angle valve: 1 set
7.7. Pressure differential inflation valve: 1 set
7.8. Dust and oil mist filter at the inlet of mechanical pump
8. Installation machine frame assembly-------------- 1 set
Adopt load-bearing cabinet design, with plastic spraying treatment on the surface of quick-release panels around; the machine is seismically strengthened and optimized in strength design so that the load can reach 2 tons; six load-bearing casters, which can be fixed and moved. The overall anti-magnetic and anti-radiation treatment of the box body effectively reduces electromagnetic interference and indirect damage to the human body. (Size: 1550mmX860mmX1800mm Weight: 400kg)
9. Vacuum measurement-------------------- 1 set
The vacuum degree of the sputtering chamber is measured by a digital 5227 gauge. The process measurement uses a thin film gauge.
10. The system uses PLC + embedded integrated touch screen industrial computer to realize full closed loop control mode
10.1. The system has experimental coating mode and fully automatic coating mode:
In the experimental coating mode, one-button start can be achieved to reach the working vacuum degree, and the coating parameters can be set manually. After the experiment, one-button automatic inflation can be performed, which saves the overall operation time. At this time, the system is in an open-loop control state.
In the fully automatic coating mode, the system can automatically run the program coating according to the pre-set process menu. This mode is suitable for small-batch production and coating process stability and reproducibility experiments. At this time, the system is in a fully closed-loop control state.
10.2. The system provides real-time computer communication, displays and records vacuum degree and heating temperature PID adjustment settings.
10.3. The system provides real-time computer communication, sets and displays DC power supply, RF power supply power parameter adjustment, gas flow control adjustment, formulates process menus and automatically records and sets various process parameters for storage.
10.4. The system provides computer MFC process gas pressure control and regulation.
10.5. The computer sets the display baffle status, sample speed, etc.
11. Quartz crystal oscillator film thickness monitor (MHY485-2CH/dual-channel water cooling)----------------------- 1 set
11.1. Monitoring film thickness display range: 0~99μ9999Å;
11.2. Thickness resolution: 1Å;
11.3. Rate display resolution: 0~9999.9Å;
11.4. Control accuracy: 1Å;
11.5. Monitoring time display range: 1 minute~99 hours;
12. Cooling water circulation integrated machine 1P-------------- 1 set;
13. Oil-free silent air pump 1200W-------------------- 1 set;
14. Several reserved leak detection ports and reserved spare ports in the vacuum chamber ------------------------1 set
