Ultra-high Vacuum Evaporation and Magnetron Composite Coating Equipment

Introduction:
The Ultra-high Vacuum Evaporation and Magnetron Composite Coating Equipment is mainly composed of organic/metal source evaporation , magnetron target vacuum deposition chamber, vacuum exhaust system , vacuum measurement system , evaporation source , sample heating temperature control , electric control system , gas distribution system , DC magnetron sputtering system, cooling Circulatory system and other parts, the whole system uses manual control. It can be used for research on the preparation of composite films.

The Ultra-high Vacuum Evaporation and Magnetron Composite Coating Equipment

Equipment composition and technical performance:
Ultimate vacuum: 6.0×10 ^-5 Pa;
Working vacuum < 5.0 ×10 ^-4 Pa ,
Pumping speed: from the atmosphere to 5.0 × 10^-4 Pa≤20min;
Leak detection rate of vacuum chamber: vacuum leak rate of sealing interface ≤ 5×10 ^-10Torr •L/s;
Pressure rise rate: ≤ 5 Pa after pumping to the ultimate vacuum and shutting down the pump for 12 hours .

1. Thermal evaporation deposition chamber components
1.1. The vacuum chamber is a D-shaped cavity, and the size of the cavity is about 350mm× 350mm× 400mm (length × width × height). There are connecting evaporation source, molecular pump, vacuum gauge, lighting, observation window, spare interface, quartz crystal probe, sample stage flange interface, front sliding door and rear opening door etc. on the top. The chamber is all made of 0Cr18Ni9Ti (non-magnetic) stainless steel material, argon arc welding, special surface technology, polishing treatment, beautiful appearance, the front and rear doors are made of high-quality aluminum alloy, light and beautiful;
1.2 . The front door is equipped with an observation window;

2. Sample deposition lift turntable mechanism:
2.1. Two stainless steel evaporating substrate holders (one of which is a spare) , with a size of 100mm×100mm , (mask plates of corresponding sizes can be made according to the requirements of the customer) .
2.2. The sample can be manually operated up and down continuously, and the distance from the sample to the evaporation source is continuously adjustable from 250mm to 300mm; the bellows is sealed and can move without leakage.
2.3. The sample can be driven by a motor-driven magnetic shaft to rotate electrically at 360 degrees; speed: the speed is continuously adjustable from 0 to 30 rpm ;
2.4. One set of manual direct shaft drive sample baffle;
2.5. The substrate is heated by imported heating wire, heating temperature: room temperature - 500 °C, controlled by thermocouple closed-loop feedback, controllable and adjustable; it can be insulated and sealed to withstand high voltage of -1000V.

3. Inorganic thermal evaporation electrode components and control power supply:
3.1. 36 evaporating water - cooled electrodes : form 2 groups of 50mm evaporation boats ; 2 metal evaporation boats (molybdenum boat, tungsten basket , or hanging wire metal evaporation source ) each
3.2. Controllable evaporation power supply : 2 sets : Temperature suitable for melting refractory metals, the maximum output power is 3.0 Kw (voltage 10V ; current 300A ).
3.3. Manual baffle assembly : 2 sets
3.4. There is a removable baffle between the evaporation sources, which prevents cross-contamination of the evaporation sources and facilitates cleaning and installation.

4. Organic evaporation source: 2 sets
4.1 . The beam source furnace heating and evaporation structure is adopted, the capacity of a single quartz crucible: ≥ 5 ml; 10 spare quartz crucibles;
4.2 , 2 sets of temperature control systems adopt closed-loop feedback of program temperature control table
Temperature range: room temperature - 600 ℃ , continuously adjustable,
Temperature control accuracy ± 0.5 ℃
4.3 . Organic beam source furnace evaporation source baffle, manual control: 2 pieces;
4.4 . Evaporation power supply: 2 sets, 500W, which can complete the evaporation of 2 different material respectively.

5. Magnetron sputtering system: 1 set
5.1 . Target size: Ф 60 mm;
5.2 . Provide target material: (stainless steel) test target 1 piece
5.3. The permanent magnet target RF sputtering is compatible and the target is water-cooled;
(Pls confirm what material will you magnetron sputtering, if it is Iron /Cobalt /Nickel material, it needs to be Strong magnetic target)
5.4 . Imported SMC rotary pneumatic control baffle assembly: 2set;
5.5 . The target is installed on the side wall of the vacuum chamber and sputters upward . The distance between the magnetron target and the substrate is adjustable, and the adjustment distance is: 90 ~ 130mm .
5.6 , 2 set of 500W RF power supply;

6. Working gas path: 1 set
6.1, Ar, mass flow controller, CF16 electric shut-off valve, pipelines, joints, etc.: 1 way in total
6.2 DN16 pneumatic inflation valve, DN16 pneumatic deflation valve, pipelines, joints, etc.: 13 lines;

7. Observation window and baffle: 1 set
Φ 100mm observation window baffle, used to observe the sample and observe the state of the evaporation source, placed on the front door .

8. (Exhaust) vacuum system
8.1. Molecular pump and control power supply : 1 set
Pumping speed: 700L/S , non - grease lubricated molecular pump can be installed at any angle.
8.2. RVP8 mechanical pump: 1 set
Pumping speed: 8 L/S
8.3. Pirani gauge is used for the front electrode pipeline : 1 set
8.4. Manual CC- 150 ultra-high vacuum gate valve: 1 piece
Used to isolate the molecular pump from the deposition chamber
8.5. Metal soft connection front electrode pipeline : 2 sets
8.6. Side pumping pipeline: 1 set
8.7 . Electric KF40 angle valve: 2 pieces (for side pumping pipeline and foreline pipeline )
8.7. Manual air release valve KF16 : 2

9. Vacuum measurement and electric control system:
9.1.Wide range digital display vacuum gauge,Measuring range: Atmosphere -- 10^-5 Pa
Resistance gauge: 1.0×10⁵ Pa ---1.0× 10^-1 Pa, Ionization gauge: 1.0×10 ^-1Pa ---1.0×10^-5 Pa
9.2 . Power supply cabinet: 1 set, on bottom of equipment chamber.
9.3. Main control power supply: provide power supply for mechanical pumps, vacuum gauges, etc., with power-off and water-off protection functions: 1 set
9.4 . Motor rotating power supply: 1 set
9.5 . Inorganic evaporation power supply: 1 set Maximum output power 3 Kw (voltage 10V ; current 300A )
9.6 . Organic evaporation power supply: 1 set
9.7 . Water cut- off protection: 1 set

10. Quartz crystal oscillator film thickness tester : ( double probe)
10.1 . Thickness display range: 0--99μ9999 Å
10.2 . Thickness display resolution: 1 Å
10.3 . Speed display range: 0 -- 9999.9 Å/s
0.1 Å/s
10.5 , the number of layers: 0 -- 99 layers
10.6 . Material name display: more than 200 kinds
10.7 , two probes , one sample, one evaporation source .

11. Overall installation bench components:Independent frame, equipped with movable universal wheels, square steel, surface sprayed.

12. Two spare CF35 flange ports

13. Electric control system 1 set
system adopts manual switch control, and is equipped with safety interlock protection logic control .

14. Cooling water circulation integrated machine 1P : 1 set;

15. Conditions for on-site installation
1 ) The power supply is 380V 50Hz, the power is greater than 10 KW, the fluctuation range is less than ± 6 % , and it is equipped with multi-way wiring sockets;
2 ) Reliable ground wire, the resistance to ground is less than 2Ω;
3 ) The installation site area is larger than 8M 2 , and the height requirement is higher than 2.4M;
4 ) The standard temperature of the installation site is required to be 20 ℃ ~ 24 ℃ , and the standard relative humidity is 50% ~ 60% ;
5 ) Ordinary nitrogen is required, and the pressure should be between 2 and 3 atmospheres;
6 ) Exhaust exhaust pipes;