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High Temperature CVD Tube Furnace System
  • High Temperature CVD Tube Furnace System
  • High Temperature CVD Tube Furnace System
  • High Temperature CVD Tube Furnace System
  • High Temperature CVD Tube Furnace System
  • Model:KJ-T1600-L10030-LC4

    High Temperature CVD Tube Furnace System

    Description:

    This system is particularly suitable for complex material fabrication processes requiring dual-temperature zones, multi-component atmospheres, vacuum, or low pressure....

    Product Introduction:
    The KJ-T1600-L10030-LC4 is a highly integrated, compact tube furnace system composed of three core modules: a dual-zone high-temperature tube furnace, a 4-channel precision mass flow meter mixing system, and a rotary vane vacuum pump system. An optional water chiller for flange cooling is also available. This system is specifically designed for advanced material synthesis and process development requiring precise atmosphere control, dual-zone gradient heat treatment, and a vacuum environment.

     

    Application Areas:

    This system is particularly suitable for complex material fabrication processes requiring dual-temperature zones, multi-component atmospheres, vacuum, or low pressure. Typical applications include:

    1. Chemical Vapor Deposition (CVD) and Two-Dimensional Materials
    CVD growth of two-dimensional materials such as graphene, boron nitride, and molybdenum disulfide (MoS₂): Dual-temperature zones allow independent control of precursor evaporation temperature and deposition substrate temperature; 4-channel MFC allows precise control of carrier gas (Ar/H₂), carbon source (CH₄/C₂H₂), and dopant gas.

    Carbon Nanotube (CNT) Array Growth: Utilizes temperature gradients to control catalyst activation and carbon source decomposition.

    2. Advanced Ceramics and Composite Materials
    Pressureless sintering or reactive sintering of non-oxide ceramics (Si₃N₄, SiC, AlN), with the introduction of N₂, Ar, or reducing atmospheres.

    Denaturation of Ceramic Matrix Composites (CMCs): Gradient sintering is achieved through dual-temperature zones.

    3. High-Temperature Vacuum Sintering of Transparent Ceramics (YAG, MgAl₂O₄)

    4. Powder Metallurgy and Refractory Metals.

    5. Vacuum or Hydrogen Sintering of Refractory Metal Powders such as Tungsten, Molybdenum, Tantalum, and Niobium.

    6. Pressure-Controlled Sintering of Hard Carbide (WC-Co) Using MFC with Precisely Proportional Ar/CH₄/H₂ Atmospheres.

    7. New Energy Materials

    8. High-Temperature Sintering (1200-1500℃) of Solid-State Electrolytes for Lithium Batteries (LLZO, LATP), with O₂ or Ar introduced to prevent lithium volatilization.

    9. Fuel Cells: Co-firing of electrolytes and electrodes in Solid Oxide Fuel Cells (SOFCs); Heat Treatment of Catalysts in Proton Exchange Membrane Fuel Cells (PEMFCs).

    10. Solar Cells: Annealing of Perovskite Absorber Layers; Selenization Treatment of CIGS Materials (requires H₂Se or Se vapor).

    11. Powder Metallurgy and Refractory Metals

    2. Vacuum or Hydrogen Sintering of Refractory Metal Powders such as Tungsten, Molybdenum, Tantalum, and Niobium. 5. Catalysts and Chemical Engineering
    Calcination, reduction, and activation of multi-component catalysts: Temperature-programmed reduction (TPR) or temperature-programmed oxidation (TPO) achieved through MFC.

    Catalytic CVD: Growth of carbon nanofibers or graphene on catalyst surfaces.

    6. Materials Phase Transformation and Thermal Analysis
    Studying high-temperature phase transformations, thermal expansion, and oxidation behavior of materials under controlled atmospheres.

    7. Universities and Research Institutes
    Serving as a multifunctional high-temperature reaction platform for comprehensive experiments and cutting-edge research in materials science, physics, chemistry, and chemical engineering.

    features
    • The four-in-one integrated system combines a dual-zone tubular furnace, a 4-channel MFC mixing system, a vacuum pump, and a water chiller (optional), providing a one-stop solution for complex atmosphere heat treatment needs.

    • Dual-zone independent temperature control: Two 220mm heating zones can be set to different temperatures to achieve temperature gradients, extended uniform temperature fields, or localized high temperatures, with a temperature control accuracy of ±1℃.

    • 7-inch touchscreen control; user-friendly interface; programmable 30-segment temperature rise and fall curves; real-time monitoring and recording; supports RS485 remote communication.

    • Four independent MFC controls, customizable range, total accuracy ±1% FS, and when used with a gas mixing tank, it enables precise mixing of multi-component atmospheres (such as Ar/H₂/CH₄, etc.).

    Technical Parameters
    Model KJ-T1600-L10030-LC4
                      Part I: Tube Furnace

     
    Tube Furnace
     
     
    Display 7’’ Touch screen
     
    Furnace Structure Split type and upper part can be opened.
    Double layer steel casing with air cooling to keep furnace surface temperature lower than 60°C. High purity fibrous alumina insulation for Max. energy saving.
    Max. Temperature 1600℃ for short time
    Continuous Woking Temp. ≤1500℃
    Heating Rate Suggestion: 0~10℃/min (max. 20℃/min)
    Temperature Zone Double zones
    220+220mm
    Heating Element MoSi2 rods
    Thermocouple B type
    Temperature Control Accuracy ±1℃
    Processing Tube OD80 x 1000mm (OD x L)
    Material:  High pure Alumina
    Flanges Flanges made of 304SS
    Gas valve and pressure gauge on left flange
    Vacuum angle valve with KF25 connector on the right flange
      Two fibrous ceramic blocks are included for blocking heat radiation from inside tube (Ceramic blocks must be fully inserted into the furnace chamber before heating).
     
    Temperature Controller -Two temperature controllers control the heating zones separately.
    -PID automatic control via SCR (Silicon Controlled Rectifier) power control
    -30 programmable segments for precise control of heating rate.
    -Built-in over temperature alarm and protection allows for operation without an attendant.
    -Furnace with R&S485 communications port and software, which can control on the computer
    Power 220V, 50 Hz, single- phase(or according to your requirement) 
    max.8KW
    Part II:  4 Channels Mass Flow Meter and Controllers
    Gas Mass Flow Meter
     
     
     
     
     
     
    (touch screen is optional)
    4 precision mass flow meters :
    MFC 1: Gas flow range from 0~100 sccm   
    MFC 2: Gas flow range from 0~500 sccm     
    MFC 3: Gas flow range from 0~500 sccm
    MFC 4: Gas flow range from 0~1000 sccm    
    Please inform us the gas type and measuring range before place order.
    Flowing rate accuracy: ±1% FS
    One gas mixing tank is installed on bottom case with liquid release valve
    4 stainless steel needle valves is installed on left side of bottom case to control 4 type gases mixing manually
    Part III: Vacuum Pump system

    Vacuum Pump System
    Rotary Vane Vacuum Pump
    Include KF25 Adpater, bellow for vacuum pump and cart with wheel 
    Ultimate vacuum 10-3 Torr. And vacuum inside the tube is around 10-1 Torr.
    Flow rate: 2.2L/S

     
    Part IV: Water cooling system

    Water chiller
    Water cooling on the flange is mainly for cooling down the o-ring inside the flange to ensure the best-sealed chamber at high temperature:
    Water cooling flanges require >= 10L/M water flow.

    Inquiry

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    Application areas

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    Tel Number

    180-3717-8440

    Email

    web@kejiafurnace.com

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